Dear Labmembers,
Does anybody have experience of using phosphorus spin on dopants (SOD)? I have the P509 SOD (~ 10% Phos) from Filmtronics. Here is the process flow that I've tried on epi-Ge substrates:
1. Coat : 3000rpm for 10s
2. Bake : 200C, 2 mins on a hotplate
3. RTP : 600C, 10s, Forming Gas ambient
4. SOD removal : 6:1 BOE, 2 min.
Few issues that I'm facing right now:
1. The SOD film develops some cracks after baking.
2. It's hard to remove the SOD film after RTP. Even a longer BOE clean doesn't seem to get rid of all the residue.
Any suggestions/tips on how to work with this SOD will be much appreciated!
Thanks,
Suyog
Subscribe to:
Post Comments (Atom)
1 comment:
Dear Suyog, I am currently facing exactly the same problem with P509 SOD on Ge and always get cracks and even peeling of the film. Did you find a solution for these problems ? We start now with SOD and the first tests with Si worked well, but results on Ge were really horrible ...
Regards
Stefano
Post a Comment